标题： 一种加压氢引起的薄膜起泡模型 显示英文标题

标题： A model for pressurized hydrogen induced thin film blisters

摘要： 我们介绍了一个用于纳米厚度薄膜中氢诱导气泡形成的模型。 该模型假设分子氢被截留在圆形气泡盖下，导致其弹性向外偏转，直到形成稳定的气泡。 在第一部分中，计算了形成稳定气泡所需的能量平衡。 从该模型中，可以计算出气泡盖的粘附能、内部压力以及气泡形成的临界氢剂量。 在第二部分中，计算了气泡生长至稳定尺寸所需的通量平衡。 该模型应用于在暴露于氢离子后的Mo/Si多层膜中形成的气泡。 根据模型，Mo/Si气泡盖的粘附能被计算为约1.05 J/m2，内部压力范围为175-280 MPa。 基于模型，计算出气泡形成开始的最小离子剂量为d = 4.2*10^18 ions/cm2。 从通量平衡方程中，估算出Mo/Si气泡盖的扩散系数为D_H2 = (10+-1)*10^18 cm2/s。 显示英文摘要

摘要： We introduce a model for hydrogen induced blister formation in nanometer thick thin films. The model assumes that molecular hydrogen gets trapped under a circular blister cap causing it to deflect elastically outward until a stable blister is formed. In the first part, the energy balance required for a stable blister is calculated. From this model, the adhesion energy of the blister cap, the internal pressure and the critical H-dose for blister formation can be calculated. In the second part, the flux balance required for a blister to grow to a stable size is calculated. The model is applied to blisters formed in a Mo/Si multilayer after being exposed to hydrogen ions. From the model the adhesion energy of the Mo/Si blister cap was calculated to be around 1.05 J/m2 with internal pressures in the range of 175-280 MPa. Based on the model a minimum ion dose for the onset of blister formation was calculated to be d = 4.2*10^18 ions/cm2. From the flux balance equations the diffusion constant for the Mo/Si blister cap was estimated to be D_H2 = (10+-1) *10^18 cm2/s.