标题： 定量分析氦离子注入表面的残余应力及其对起泡的影响 显示英文标题

标题： Quantifying residual stress in Helium implanted surfaces and its implication for blistering

摘要： 氦离子注入表面对于等离子体面对材料和其他核应用具有研究价值。 钒作为一种代表性的体心立方材料以及适用于聚变应用的材料，使用氦离子束显微镜进行注入，并量化了产生的膨胀和纳米力学性能。 这些数值与通过聚焦离子束环芯技术获得的微观残余应力测量数据进行了相关性分析。 我们发现测得的膨胀值与文献值相似。 此外，我们能够测量由注入引起的表面应力，并发现其在气泡形成剂量下接近材料的屈服强度。 本工作中进行的简单计算以及从实验结果中推导出的几个几何考虑因素证实，气泡形成的驱动力主要来自气体压力积聚导致的膨胀，而不是单纯由应力引起的屈曲。 显示英文摘要

摘要： Helium implantation in surfaces is of interest for plasma facing materials and other nuclear applications. Vanadium as both a representative bcc material and a material relevant for fusion applications is implanted using a Helium ion beam microscope, and the resulting swelling and nanomechanical properties are quantified. These values are put in correlation to data obtained from micro residual stress measurements using a focused ion beam based ring-core technique. We found that the swelling measured is similar to literature values. Further we are able to measure the surface stress caused by the implantation and find it approaches the yield strength of the material at blistering doses. The simple calculations performed in the present work, along with several geometrical considerations deduced from experimental results confirm the driving force for blister formation comes from bulging resulting mainly from gas pressure buildup, rather than solely stress induced buckling.